Hi-TECH Beauty Labs Wins Patent, Seeks $5M SEED Round
Dallas – October 14, 2026 -- Hi-TECH Beauty Labs, Corp. (HTBL) is pursuing a $5 million SEED round after the U.S. patent office issued Patent No. 12,642,834 B2 for B3 Technology®, a botanical platform for problem skin that avoids benzoyl peroxide, salicylic acid, adapalene and retinol.
The patent was issued June 2, 2026. HTBL will present its commercialization strategy and capital opportunity at the Global Capital Network Investor Conference on October 15, 2026, at the Renaissance Newport Beach Hotel in Newport Beach, California.
Patent covers three botanical ingredients
The patent protects B3 Technology®, which incorporates Black Willow Bark (Salix nigra), Cat's Claw (Uncaria tomentosa) and Dragon's Blood (Croton lechleri). HTBL describes the formulation as 100% natural and positions it as an alternative to acid-based formulations for problem skin and aging skin.